IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Thin Films Wednesday Sessions

Session TF-WeM
Fundamentals of Deposition

Wednesday, October 31, 2001, 8:20 am, Room 123
Moderator: J. Colligon, Manchester Metropolitan University, U.K.


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:40am TF-WeM2
Molecular Dynamics Simulations of Self-bombardment of Compact Clusters on Pt(111)
D. Adamovic, E.P. Münger, V. Chirita, L. Hultman, Linköping University, Sweden, J.E. Greene, University of Illinois, Urbana
9:00am TF-WeM3
On the Relative Motion of Thermal Gas Atoms In the Monte Carlo Simulation of Sputtering
T. Nakano, S. Baba, Seikei University, Japan
9:20am TF-WeM4
Self-Similar Structure Evolution and Surface Reaction Kinetics in Low Temperature Silicon Deposition
G.N. Parsons, K.R. Bray, A. Gupta, North Carolina State University
9:40am TF-WeM5
Atomic-Scale Processes in the Growth of Transition-Metal Nitrides
D. Gall, C.-S. Shin, M.A. Wall, I. Petrov, J.E. Greene, University of Illinois, Urbana
10:00am TF-WeM6
Low Temperature Synthesis of Fully Textured Highly Oriented AlN Films by RF and Pulsed DC Reactive Sputtering
G.F. Iriarte, F. Engelmark, I.V. Katardjiev, Uppsala University, Sweden, H.P. Loebl, Philips GmbH, Germany
10:40am TF-WeM8
A Theoretical Study of the Chemical Vapor Deposition of (100) Silicon from Silane
J.K. Kang, C.B. Musgrave, Stanford University
11:00am TF-WeM9
Gas and Surface Reactions of Radicals in Hot Wire CVD of Amorphous Silicon
H.L. Duan, G.A. Zaharias, S.F. Bent, Stanford University
11:20am TF-WeM10
In-Situ Determination of the Deposition Chemistry During BPSG Dielectric Thin Film Growth
L.D. Flores, J.E. Crowell, University of California, San Diego