IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Thin Films Tuesday Sessions

Session TF-TuM
Optical Thin Films

Tuesday, October 30, 2001, 8:20 am, Room 123
Moderator: J. Verhoeven, FOM Institute, The Netherlands


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:20am TF-TuM1
Influence of Processing Conditions on Sputter Deposited ZnO:Al Thin Films
L.W. Rieth, P.H. Holloway, University of Florida
8:40am TF-TuM2
Linear Combinatorial Synthesis of Cadmium Tin Oxide Films by Low-pressure Chemical Vapor Deposition
X. Li, T. Gessert, T. Coutts, National Renewable Energy Laboratory
9:00am TF-TuM3 Invited Paper
Challenges in the Development of Novel Transparent Conducting Oxides
T. Coutts, D.S. Ginley, D.L. Young, X. Li, J.D. Perkins, National Renewable Energy Laboratory
9:40am TF-TuM5
Kinetics of Hydrogen Induced Changes of Optical Properties in Smart Coatings
M. Wuttig, Aachen University of Technology, Germany
10:00am TF-TuM6
Plasma Enhanced Chemical Vapour Deposition of SiO@sub x@N@sub y@ for Large Area Applications in a Matrix Distributed Electron Cyclotron Resonance Reactor
A. Hofrichter, A. Charaya, B. Drevillon, Ecole Polytechnique CNRS, France
10:20am TF-TuM7
High Growth Rate Deposition of a-SiN@sub x@:H Films for Photovoltaic Applications
J. Hong, W.M.M. Kessels, F.J.H. Van Assche, D.C. Schram, M.C.M. van de Sanden, Eindhoven University of Technology, The Netherlands
10:40am TF-TuM8
Electrical Characteristics and Growth of ZrO@sub2@ as a Gate Dielectric
Y. Kim, Y. Kim, H. Jeon, Hanyang University, Korea
11:20am TF-TuM10
Effect of Cation Charge State and Site Occupancy on the Dielectric Response of ITCO Spinel Films
C.F. Windisch Jr., K.F. Ferris, G.J. Exarhos, Pacific Northwest National Laboratory
11:40am TF-TuM11
Multi-layer Chromium-based Optical Coatings for 157nm Lithography
P.D. Rack, B.W. Smith, A. Bourov, D. Baiko, Rochester Institute of Technology, M.G. Lassiter, Photronics Corp.