IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Plasma Science Monday Sessions

Session PS1+MM-MoM
Science & Technology of Microplasmas and MEMS Processing

Monday, October 29, 2001, 9:40 am, Room 103
Moderator: M.G. Blain, Sandia National Laboratories

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Click a paper to see the details. Presenters are shown in bold type.

9:40am PS1+MM-MoM1 Invited Paper
The Challenges of Plasma Etching in MEMs Processing
G.R. Bogart, J.T.C. Lee, A. Kornblit, H.T. Soh, K.E. Teffeau, F.P. Klemens, J.F. Miner, Agere Systems
10:20am PS1+MM-MoM3
Maskless Etching of Silicon using Patterned Microdischarges
K.P. Giapis, M. Sankaran, California Institute of Technology
10:40am PS1+MM-MoM4
Efficiency of Microfabricated ICP Sources@footnote 1@
F. Iza, J.A. Hopwood, Northeastern University
11:00am PS1+MM-MoM5
Microhollow Cathode Discharge Flow and Stability
D.D. Hsu, M.A. Nierode, D.B. Graves, University of California, Berkeley
11:20am PS1+MM-MoM6
Experimental and Numerical Model Investigations of Miniature Microwave Plasma Sources
D. Story, T.A. Grotjohn, J.A. Asmussen, Michigan State University
11:40am PS1+MM-MoM7
Potential and Current Profiles of Nitrogen Gas DC Microplasmas
C.G. Wilson, Y.B. Gianchandani, A.E. Wendt, University of Wisconsin-Madison