Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | MS-TuM1 Reduction in Loadlock Vent Time and Particles through Use of Fast Vent Diffuser C. Adcock, Mykrolis Corporation (Formerly the Microelectronics Division of Millipore Corporation), H. Dang, Texas Instruments Inc., J. Gratz, M. Randolph, J. Snow, C. Tsourides, Mykrolis Corporation, R. Wheeler, Millipore Corporation |
| 8:40am | MS-TuM2 Cleaning Procedures in Wafer Processing: Analytical Challenges for Root Cause Determination of Particle Problems C.C. Wang, Y.S. Uritsky, C.R. Brundle, Applied Materials, Inc. |
| 9:00am | MS-TuM3 Invited Paper High Productivity Plasma Etch Reactors: Hardware and Chemistry Concepts D. Podlesnik, Applied Materials |
| 9:40am | MS-TuM5 Invited Paper Data Driven Manufacturing C.J. Spanos, University of California, Berkeley |
| 10:40am | MS-TuM8 Invited Paper Gate Module Integration with High k Dielectrics S.W. Butler, Texas Instruments |