IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Vacuum Science & Technology Friday Sessions
       Session VST+MS-FrM

Invited Paper VST+MS-FrM4
Vacuum System Architecture for Disk and Flat Panel Production Tools

Friday, November 2, 2001, 9:20 am, Room 125

Session: Semiconductor & Functional Coating Systems & Processes
Presenter: J. Busch, Intevac Inc.
Authors: J.L. Hughes, Intevac Inc.
J. Busch, Intevac Inc.
Correspondent: email address not available

Production tools using high vacuum environments are increasingly used by industry, with their requirements growing more difficult. Two such applications are flat panel displays and magnetic hard disks. The flat panel uses up to 1.2 x 1.6 meter rectangular substrates of 1.1 mm thick glass, while hard disks are typically 95 mm circular aluminum. The methods for thin film deposition by sputtering for the two systems varies greatly for the two applications. The same thing is true for substrate transport. But some methods and principals remain the same in either type of production. Vacuum levels run from 1.0E-08 Torr for high vacuum to sputtering pressures of 5.0E-03 Torr. This article looks at two specific examples of vacuum system architecture and draws out the specifics of difference and samenesss between the two.