IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Thin Films Monday Sessions
       Session TF-MoP

Paper TF-MoP9
Atomic Force Microscopy Observation of TiO@sub2@ Films Deposited by dc Reactive Sputtering

Monday, October 29, 2001, 5:30 pm, Room 134/135

Session: Multilayers and Thin Film Characterization Poster Session
Presenter: H. Nakabayashi, Toyama University, Japan
Authors: T. Takahashi, Toyama University, Japan
H. Nakabayashi, Toyama University, Japan
N. Sasai, Toyama University, Japan
K. Masugata, Toyama University, Japan
Correspondent: Click to Email
A bombardment of energetic particles such as secondary electrons and recoiled ions ejected from the target plane is very useful technique for modifying the structure of the film in reactive sputtering. It leads to the interesting effects such as enhancement of reactivity, adatom mobility and atomic peening. Therefore, the state on the surface of the as-deposited film may significantly depend on the bombardment condition. So, in this study, the relationship between the surface morphology and the crystal structure of TiO@sub2@ films has been investigated in detail. TiO@sub2@ films with thickness of about 2-3 µm were deposited by dc reactive sputtering on glass-slide substrates. The crystal structure and surface roughness of films were measured with a X-ray diffractometry and an atomic force microscopy (AFM), respectively. The A(101), A(200), A(112) and A(220) peaks were observed from the X-ray diffraction patterns, where A shows an anatase of TiO@sub2@. With increasing energy and number of bombarding particles, X-ray peak intensities I@subP@ of A(101) and A(200) gradually decreased, and I@subP@ of A(112) and A(220) gradually increased, respectively. A(220) peak was significantly higher than others. The crystallinity of TiO@sub2@ film was highly improved and its crystallite size became larger with an increase of them. The roughness parameter Ra on the surface of TiO@sub2@ films also depended on them. Ra increased in the range of 4 to 51 nm with increasing energy and number of bombarding particles. Consequently, it was found that the surface morphology and the crystal orientation of TiO@sub2@ films strongly affected to the bombardment of energetic particles to the growing film.