IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    NBS-NIST Centennial Sunday Sessions
       Session NB-SuP

Paper NB-SuP7
Surface and Microanalysis Science Division: From XPS Standards to Near-field Optical Microscopy.

Sunday, October 28, 2001, 6:20 pm, Room 121

Session: NBS/NIST Centennial
Presenter: R.R. Cavanagh, National Institute of Standards and Technology
Authors: R.R. Cavanagh, National Institute of Standards and Technology
S.J. Stranick, National Institute of Standards and Technology
C.A. Michaels, National Institute of Standards and Technology
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The Surface and Microanalysis Science Division at NIST has worked with the AVS community over the years to develop the measurement science that underlies a range of surface measurements. Key activities have included theoretical and experimental efforts ranging from the modeling of inelastic electron scattering events at surfaces, studies of ion, electron, and photon induced surface reactions, and optical probes of buried interfaces, to energy and state and time-resolved studies of the dynamics of surface processes. Recent efforts have investigated the use of near-field optical methods to combine spectroscopic contrast with the spatial resolution of scanned probe methods. We have developed an infrared near-field scanning optical microscope that incorporates a tabletop femtosecond laser-based infrared source with an illumination mode apertured probe. The application of the near field infrared instrument to thin homopolymer films, to blends of polyethylacrylate and polystyrene, and to titanium dioxide particles with acrylic melamine will serve to illustrate the utility of this method for characterizing chemical nanostructures.