IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Manufacturing Science and Technology Tuesday Sessions
       Session MS-TuA

Paper MS-TuA10
New Mass Spectrometer without Fragment Ions for CVD In-situ Monitoring

Tuesday, October 30, 2001, 5:00 pm, Room 131

Session: In Line and In Situ Process Control
Presenter: Y. Shiokawa, Anelva Corporation, Japan
Authors: Y. Shiokawa, Anelva Corporation, Japan
M. Nakamura, Anelva Corporation, Japan
K. Hino, Anelva Corporation, Japan
T. Sasaki, Anelva Corporation, Japan
Correspondent: Click to Email
In-situ gas monitoring of CVD depending on complicated reactions is more essential and has three objects; residual gases, materials and byproducts (precursors). Residual gases can be measured but the others are difficult by a conventional mass spectrometer using electron impact (EI) ionization. The reason is fragmentation; molecules with low binding energy for CVD are inevitably dissociated and become fragment ions. Therefore, we have developed a new apparatus as commercial product by means of Ion Attachment Mass Spectrometry (IAMS),@footnote 1@ in which a metal ion attaches to a molecule and the excess energy is so small that fragmentation could be avoided. First, we measured PFCs gases exhausted from a plasma-etching system.@footnote 2@ The mass spectra by IAMS showed every natural molecular ion corresponding to materials and byproducts, while not molecular ions at all but merely many fragment ions by EI. So, some diagnostics as well as monitoring was done. Next, we have applied to CVD. Some parts about gas introduction and metal ion emission have been improved because CVD gases are more adsorptive and adhesive. The apparatus, connected to the process chamber of Plasma-CVD, measured SiH@sub 4@, NF@sub 3@ and others as molecular ions. On the other hand, although a metallic-organic molecule for Cu deposition by MO-CVD has very low binding energy, its molecular ion was successfully detected. In-situ monitoring of MO-CVD using low vapor pressure materials is especially desired and seems to be realized by IAMS. We would like to present some examples of CVD in-situ monitoring throughout our talk. @FootnoteText@ @footnote 1@ T.Fujii, Mass Spectrometry Review 19 (2000) 111 @footnote2@ M.Nakamura et al JVST-A Vol.19,No4 (2001) to be published