It is well known that wafer-handling protocols to avoid contamination are a mandatory part of semiconductor fabrication. One of the most significant pieces of the standard "cleanroom" suit is the glove worn to eliminate contamination from human skin, of which mobile ions from fingerprint oils are a major contributor. Once the glove is in place, it is often considered unnecessary to use appropriate tools when the wafers are to be submitted for testing or analysis. This paper will show that wafer handling, even with fabrication recommended gloves in place, still significantly contaminates the wafer. The study began with a prime Si wafer that was divided into sections for experimentation. One piece of the wafer was not touched and would become the control sample. The remaining pieces were touched with bare hands along with various gloves that were all approved for use in a fabrication environment. An intriguing observation was that fingerprint-like marks were visible in all cases where the wafer had been touched. Secondary Ion Mass Spectrometry was then utilized to analyze the fingerprinted areas. Mobile ion contamination was found to be associated with many of the gloves in the study. It was also verified that the contamination was coming from the glove itself and not diffusing through the glove from the hands.