| AVS 47th International Symposium | |
| Thin Films | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | TF-WeM1 Invited Paper Hyperthermal Ion Enhanced Deposition of Materials J.W. Rabalais, University of Houston |
| 9:00am | TF-WeM3 Thin-Film Growth on Polymer Surfaces through Polyatomic Ion Deposition: Molecular Dynamics Simulations Y. Ji, S.B. Sinnott, The University of Kentucky |
| 9:20am | TF-WeM4 Molecular Dynamics Simulation of Ion Bombardment on Hydrogen-terminated Si(001)-(2X1) Surfaces K. Satake, Mitsubishi Heavy Industries, Ltd., Japan, D.B. Graves, University of California, Berkeley |
| 9:40am | TF-WeM5 Low Temperature Growth of 2D Pb Islands on Si(111)7x7 Surfaces C.S. Chang, Academia Sinica, Taiwan, ROC, S.H. Chang, National Tsing Hua University, Taiwan, ROC, W.B. Su, C.M. Wei, Academia Sinica, Taiwan, ROC, L.J. Chen, National Tsing Hua University, Taiwan, ROC, TienT. Tsong, Academia Sinica, Taiwan, ROC |
| 10:00am | TF-WeM6 Modeling of Cluster Ion-Surface Interactions with Full Inclusion of Internal Degrees of Freedom K.J. Boyd, University of New Orleans, A. Lapicki, S.L. Anderson, University of Utah |
| 10:20am | TF-WeM7 Extension Velocities for Level Set Based Surface Profile Evolution D.F. Richards, S. Sen, M.O. Bloomfield, T.S. Cale, Rensselaer Polytechnic Institute |
| 10:40am | TF-WeM8 Models of Electrochemical Deposition of Copper Thin Films:The Effect of Leveling Agents S. Soukane, T.S. Cale, Rensselaer Polytechnic Institute |