AVS 47th International Symposium
    Plasma Science and Technology Tuesday Sessions

Session PS2-TuA
Plasma Diagnostics I

Tuesday, October 3, 2000, 2:00 pm, Room 311
Moderator: T. Tatsumi, Association of Super-Advanced Electronics Technologies (ASET)


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Click a paper to see the details. Presenters are shown in bold type.

2:00pm PS2-TuA1
Effect of Xenon Dilution on Fluorocarbon Plasma Chemistry and Electron Distribution Function
H. Sugai, T. Ishijima, M. Ikeda, Nagoya University, Japan
2:20pm PS2-TuA2
Comprehensive Measurements of Neutral and Ion Number Densities, Neutral Temperature, and EEDF in a CF@sub 4@ ICP
H. Singh, J.W. Coburn, D.B. Graves, University of California at Berkeley
2:40pm PS2-TuA3 Invited Paper
Planar Laser-Induced Fluorescence Investigation of Fluorocarbon Plasmas
K.L. Steffens, M.A. Sobolewski, National Institute of Standards and Technology
3:20pm PS2-TuA5
Determination of Electron Temperature, Fluorine Concentration, and Gas Temperature in Fluorocarbon/Argon Plasmas using Optical Emission Spectroscopy
M. Schabel, V.M. Donnelly, A. Kornblit, W. Tai, F. Klemens, Lucent Technologies, Bell Laboratories
3:40pm PS2-TuA6
Time-Resolved Measurements of Fluorocarbon Radical Concentrations during Pulsed Oxide Etching Plasmas
T.M. Bauer, X. Wu, J.L. Cecchi, University of New Mexico
4:00pm PS2-TuA7
Development of an Instrument: Resonantly Enhanced Multiphoton Ionization of Radicals Detected Using Time of Flight Mass Spectrometry
W.C. Flory, K.L. Williams, E.R. Fisher, Colorado State University
4:20pm PS2-TuA8
Temperature and Distance Dependencies of Fluorocarbon Species Desorbed from Polymer Deposited Metal Surface in C@sub 4@F@sub 8@ Inductively Coupled Plasma
H.-H. Doh, University of Tokyo, Japan, T. Ichiki, Toyo University, Japan, Y. Tezuka, Y. Horiike, University of Tokyo, Japan
4:40pm PS2-TuA9
C@sub x@H@sub y@ Radical Measurements using Cavity Ring Down Spectroscopy in a Remote Ar/C@sub 2@H@sub 2@ Plasma
M.C.M. van de Sanden, K.Y. Letourneur, M.G.H. Boogaarts, D.C. Schram, Eindhoven University of Technology, The Netherlands
5:00pm PS2-TuA10
Electron Energy Control in Large-Diameter Inductively Coupled Plasma for High Performance of Etching
T. Urayama, T. Tsurumi, Tokai University, Japan, Y. Horiike, The University of Tokyo, Japan, S. Fujii, ADTEC Co., Ltd., Japan, H. Shindo, Tokai University, Japan