AVS 47th International Symposium | |
Plasma Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
2:00pm | PS1-ThA1 Plasma Surface Modification of PET and Acrylic Coating Surfaces M.K. Shi, Pacific Northwest National Laboratory, A. Tyryshkin, Princeton University, G.C. Dunham, M. Bowman, G.L. Graff, P.M. Martin, G.J. Exarhos, Pacific Northwest National Laboratory |
2:20pm | PS1-ThA2 Exploring Chemical Mechanisms behind Hydrophilic Surface Modification of Polymeric Membranes by Low-temperature Plasma Treatment M.L. Steen, E.R. Fisher, Colorado State University |
2:40pm | PS1-ThA3 Invited Paper The Mechanisms of Anisotropy Control in Plasma Etching Processes L. Vallier, CNRS/LTM, France, G. Cunge, CEA/LETI, France, J. Foucher, D. Fuard, CNRS/LTM, France, R.L. Inglebert, O. Joubert, LTM/CNRS, France |
3:20pm | PS1-ThA5 Pulsed Plasma Polymerisation of Acrylic Acid S. Fraser, D.B. Haddow, R.D. Short, University of Sheffield, UK |
3:40pm | PS1-ThA6 Control of Ion Energies in RF Plasmas used for the Surface Modification of Polymers D. Barton, J.W. Bradley, UMIST, UK, D.A. Steele, R.D. Short, University of Sheffield, UK |
4:00pm | PS1-ThA7 Surface Chemical Patterning by Plasma Polymerization R.D. Short, N. Bullett, A.J. Beck, University of Sheffield, UK, C. Blomfield, Kratos Analytical, UK |
4:20pm | PS1-ThA8 The Relationship between Deprotection and Film Thickness Loss during Plasma Etching of Chemically Amplified Resists A.P. Mahorowala, D.R. Medeiros, IBM T.J. Watson Research Center |
4:40pm | PS1-ThA9 Study of Defects Induced on Graphite Surface by Low Pressure Argon Plasma A.L. Thomann, P. Brault, GREMI (CNRS), France, H. Estrade-Szwarckopf, B. Rousseau, CRMD (CNRS), France, C. Andreazza-Vignolle, P. Andreazza, CRMD (Universite d'Orleans), France |
5:00pm | PS1-ThA10 Novel Technique to Enhance Etch Selectivity of Carbon ARC over PR based on O@sub 2@/CHF@sub 3@/Ar Gas Chemistry J. Hong, J.S. Jeon, Y.B. Kim, T.-H. Ahn, Samsung Electronics, South Korea |