| AVS 47th International Symposium | |
| Photonics | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| PH-TuP1 Optical Processes in PMMA, SiO@sub 2@ and Hybrid Organic-Inorganic Sol-Gel Films Colored with Rhodamines J.J. Pérez-Bueno, S.R. Vazquez-García, Universidad Autónoma de Querétaro, México, L. García-González, Yu.V. Vorobiev, J. González-Hernández, Unidad Querétaro, México |
| PH-TuP2 Band Gap Modulation from 0.5 eV to 1.5 eV Employing the Alloy (CdTe)@sub x@(In@sub 2@Te@sub 3@)@sub 1-x@@footnote 1@ M. Meléndez-Lira, CINVESTAV-IPN, México, M. Zapata-Torres, CICATA-IPN, México, R. Castro-Rodríguez, CINVESTAV-IPN, México |
| PH-TuP3 Waveguiding in Microchip Lasers N.J. van Druten, Leiden University and Delft Technical University, The Netherlands, S.S.R. Oemrawsingh, Y. Lien, C. Serrat, M.P. van Exter, J.P. Woerdman, Leiden University, The Netherlands |
| PH-TuP4 Integrated Optoelectronic Sensor Based on GaN D. Starikov, E. Kim, C. Boney, J.-W. Um, I. Hernandez, N. Medelci, A. Bensaoula, University of Houston |
| PH-TuP5 Fabrication and Optical Properties of Ordered Nanoscale Silicon Structures A. Wellner, R. Neuendorf, R.E. Palmer, The University of Birmingham, UK |
| PH-TuP6 Etching of Optical Coating Oxides in Fluorine and Chlorine Plasmas W.B. Song, W. Liu, J.J. Talghader, University of Minnesota |
| PH-TuP7 Study of the GaAs etching with the Electron Cyclotron Resonance Source Plasmas P. Kumar, S.K. Angra, L.M. Bharadwaj, R.P. Bajpai, Central Scientific Instruments Organisation, India |
| PH-TuP8 Effect of Dry Etching Conditions on Surface Morphology and Optical Properties of GaN Films in Chlorine-Based Inductively Coupled Plasmas Y.B. Hahn, Chonbuk National University, South Korea, B.-C. Cho, LG Precision Co., Ltd., Y.-H. Im, Chonbuk National University, South Korea |
| PH-TuP9 Plasma Etching Research in Integrated Photonics K.H.A. Bogart, M.A. Cappuzzo, L.T. Gomez, J.F. Bailey, R.W. Long, Bell Laboratories, Lucent Technologies |