AVS 47th International Symposium
    Vacuum Technology Wednesday Sessions
       Session VT-WeM

Paper VT-WeM7
Vacuum Characteristics of Sprayed Metal Films

Wednesday, October 4, 2000, 10:20 am, Room 201

Session: Sorption Processes and Leak Detection
Presenter: M. Minato, Vacuum Metallurgical Co., Ltd., Japan
Authors: M. Minato, Vacuum Metallurgical Co., Ltd., Japan
H. Iwamoto, Vacuum Metallurgical Co., Ltd., Japan
Correspondent: Click to Email
The need to reduce particles in semiconductor equipment or data storage equipment is increasing. In recent years, barrier and glue layers on shielding have been used to reduce particles generated in physical vapor deposition equipment. For this purpose, spray coatings are applied to shield components after contaminations are removed. Although the sprayed metal films are exposed to vacuum in a vacuum chamber, their vacuum characteristics have seldom been investigated. The conventional spray coatings are usually done under atmospheric conditions. In order to obtain a layer that has a better vacuum characteristic, spray coating in a chamber filled with an inert gas was developed. Outgassing characteristics of sprayed aluminum films and titanium films were investigated by using the conductance modulation method. Sprayed titanium film produced in an inert gas system showed a lower outgassing rate than that produced in an atmospheric condition.