AVS 47th International Symposium
    Surface Science Wednesday Sessions
       Session SS3-WeA

Paper SS3-WeA10
Evolution of Ni(110) Surface with Low Energy Ion Sputtering

Wednesday, October 4, 2000, 5:00 pm, Room 210

Session: Surface and Interface Structure I
Presenter: S.-J. Kahng, Seoul National University, Korea
Authors: S.-J. Kahng, Seoul National University, Korea
B.-Y. Choi, Seoul National University, Korea
J.-Y. Park, Seoul National University, Korea
Y. Kuk, Seoul National University, Korea
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We have studied the spatio-temporal evolution of the Ni(110) surface structure induced by the low energy ion sputtering with scanning tunneling microscopy. In order to have better understanding of the sputtering kinetics, we performed sputtering and homoepitaxial growth experiments at 295 K. In the early stage of sputtering, erosion pits and adatom islands, elongated along the [110], are present with asymmetric adatom kinetics. They become seeds for the ripple structure under the strong diffusion bias along the [001] direction. The surface roughness increases linearly with sputtering time. In the late stage of sputtering, however, symmetric mounds replace the ripple structure and the surface roughness saturates to certain point, showing good agreement with the recent numerical simulation on the basis of nonlinear Kuramoto-Sivashinsky equation.