AVS 47th International Symposium
    Processing at the Nanoscale/NANO 6 Thursday Sessions
       Session NS+NANO6+MC-ThA

Paper NS+NANO6+MC-ThA3
Near-field Optical Measurements of Two Types of the Super-resolution Near-field Structures

Thursday, October 5, 2000, 2:40 pm, Room 302

Session: Near-field Optics and Photonics
Presenter: D.P. Tsai, National Taiwan University
Authors: D.P. Tsai, National Taiwan University
W.C. Lin, National Taiwan University
Correspondent: Click to Email
Two different types of super-resolution structures for the near-field optical storage were studied. Direct experimental observation of the near-field optical properties in the super resolution near-field structures of glass/SiN(170nm)/Sb(15nm)/SiN(20nm) and glass/ZnS-SiO2(20nm)/AgOx(15nm)/ZnS-SiO2(20nm) have been achieved by using a tapping-mode tuning-fork near-field scanning optical microscope. Both propagating and evanescent field intensities were found at the focused spots of the surfaces of the super resolution structures. The evanescent intensity may result from the localized surface plasmons excited at the antimony or silver oxide. Images of the near-field intensity gradients at different excited laser powers demonstrated that the area had the static evanescent intensity could be stably controlled. Direct observation of the focused spot sizes of the static evanescent field intensity and their changes controlled by the excited laser power have demonstrated the working mechanism of both two types of super-resolution structures.