AVS 47th International Symposium
    Material Characterization Tuesday Sessions
       Session MC-TuA

Paper MC-TuA10
A New Angle on Angle Dependent XPS

Tuesday, October 3, 2000, 5:00 pm, Room 207

Session: Quantitative Surface Analysis
Presenter: K.S. Robinson, VG Scientific, UK
Authors: K.S. Robinson, VG Scientific, UK
G. Jones, VG Scientific, UK
R. White, VG Scientific, UK
J. Wolstenholme, VG Scientific, UK
Correspondent: Click to Email
Angle dependent XPS offers the ability to determine relative distributions, compositions and layer thickness for layers thinner than the XPS analysis depth. In practice, the use of angle dependent XPS is limited by the need to acquire data at several angles, usually requiring the sample to be tilted. The analysis of small features is also difficult because tilting the sample changes the analysis area as the projected shapes of the X-ray spot and / or analysis area on the sample change. We previously presented results@footnote 1@ from a commercial instrument where the electron input lens could be used to sequentially define two angles; a surface sensitive angle and a bulk sensitive angle, allowing angle dependent XPS without moving the sample. This method has now been extended to allow simultaneous collection of angle dependent XPS data from a range of angles. We present data from this instrument which shows the application to oxide thickness measurements and more complex structures. @FootnoteText@@footnote 1@QSA-10 at University of Surrey, UK, 1998.