AVS 47th International Symposium
    Material Characterization Friday Sessions
       Session MC+NS-FrM

Paper MC+NS-FrM1
RBS, AFM, and AES Characterization of Pt Films Deposited by Ion Assisted CVD

Friday, October 6, 2000, 8:20 am, Room 207

Session: Characterization of Interfaces and Thin Films
Presenter: B. Rogers, Vanderbilt University
Authors: B. Rogers, Vanderbilt University
K.A. Telari, Vanderbilt University
H. Fang, Vanderbilt University
L. Shen, Vanderbilt University
R.A. Weller, Vanderbilt University
D. Braski, Oak Ridge National Laboratory
Correspondent: Click to Email
The semiconductor industry has used focussed ion beam (FIB) systems for several years to create site specific transmission electron microscopy (TEM) and secondary electron microscopy (SEM) cross sections, repair lithography masks, and to reroute electrical current by cutting and creating current carrying paths for circuit testing. The FIB systems' capability to both etch and deposit material in defined areas makes them good candidates for use as flexible processing systems for the development of specialized circuits. For example, metal patterns deposited in a FIB system could be used to form electrical connections and sensors on micro-electromechanical systems (MEMs) devices. Properties of the deposited material as well as the process by which it is deposited must be well characterized in order for the material to be successfully used in this type of development program. This work presents results from characterization of the ion assisted chemical vapor deposition of Pt from trimethyl(methylcyclopentadienyl)platinum [C@sub 9@H@sub 16@Pt]. Films were deposited in squares ranging from 50µm on a side to 400 µm on a side. Process parameters, including precursor temperature, dwell time, and ion beam current were varied to investigate their affect on the composition of the deposited films. A specially designed sample holder and Be mask enabled Rutherford backscattering spectrometry (RBS) determination and comparison of the Pt areal densities in these small features. Atomic force microscopy was used to determine the thickness and surface morphology of the deposited films. Scanning Auger electron microscopy was used to analyze the films for oxygen and carbon. Results show that the films contain a large amount of carbon and gallium in addition to the desired platinum. The presentation will conclude with a discussion of the effects of process parameters on the films' composition and possible pathways to maximize the platinum content of the films.