| AVS 46th International Symposium | |
| Thin Films Division | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | TF-TuM1 Invited Paper Coatings from Liquid and Supercritical Carbon Dioxide B.J. Novick, E.N. Hoggan, North Carolina State University, D. Flowers, University of North Carolina, Y. Chernyak, North Carolina State University, J.M. DeSimone, North Carolina State University and University of North Carolina, R.G. Carbonell, North Carolina State University |
| 9:00am | TF-TuM3 Invited Paper Organic Films Prepared by Polymer Sputtering H. Biederman, Charles University at Prague, The Czech Republic |
| 9:40am | TF-TuM5 Plasma Enhanced Atomic Layer Deposition of Ta for Diffusion Barrier Applications A. Sherman, Sherman and Associates, Inc., S. Malhotra, S.M. Rossnagel, IBM Research Division |
| 10:00am | TF-TuM6 Atomic Layer Deposition of Tungsten and Tungsten Nitride Using Sequential Surface Reactions J.W. Klaus, S.J. Ferro, S.M. George, University of Colorado, Boulder |
| 10:20am | TF-TuM7 Relating Phase Content to Deposition Kinetics in Ultra-Thin Sputtered Tantalum Films J.F. Whitacre, University of Michigan, Z.U. Rek, Stanford Synchrotron Radiation Laboratory, S.M. Yalisove, J.C. Bilello, University of Michigan |
| 10:40am | TF-TuM8 Atomic Layer Controlled Growth of SiO@sub 2@ and Al@sub 2@O@sub 3@ on BN Particles Using Sequential Surface Chemistry J.D. Ferguson, A.W. Weimer, S.M. George, University of Colorado, Boulder |