AVS 46th International Symposium
    Thin Films Division Monday Sessions

Session TF+VM-MoA
Advances in Hard and Superhard Coatings II

Monday, October 25, 1999, 2:00 pm, Room 620
Moderator: B. Holloway, College of William & Mary


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

2:00pm TF+VM-MoA1
Characterization of PVD TiN/CN@subx@ and TiN/Si@sub3@N@sub4@ Multilayer Coatings
Y.H. Chen, Y.W. Chung, Northwestern University
2:20pm TF+VM-MoA2
Effects of Interface Mixing on Adhesion of Amorphous Carbon Films Synthesized by Variable-Energy Direct Carbon Ion Beam Deposition
M.H. Sohn, S. Kim, SKION Corporation
2:40pm TF+VM-MoA3
Synthesis of Diamondlike Carbon Films with Superlow Friction and Wear Properties
A. Erdemir, O.L. Eryilmaz, G. Fenske, Argonne National Laboratory
3:00pm TF+VM-MoA4
Optical Characteristics of Carbon Nitride: Relationship with Mechanical Behavior and Possible Fullerene-like Microstructure
V. Hajek, D. Poitras, D. Dalacu, Ecole Polytechnique, Canada, A. Bergeron, Optical Coating Laboratory Inc., L. Martinu, Ecole Polytechnique, Canada, K. Rusnak, J. Vlcek, University of West Bohemia, Czech Republic
3:20pm TF+VM-MoA5
Preparation and Properties Enhancement of Silicon Carbonitride Films Using Reactive Magnetron Sputtering
X.-M. He, K.C. Walter, M. Nastasi, Los Alamos National Laboratory
4:00pm TF+VM-MoA7
Bonding Structure and Optical Properties of Si-doped Diamond-like Films Synthesized by Plasma Immersion Ion Processing
X.-M. He, K.C. Walter, M. Nastasi, Los Alamos National Laboratory
4:20pm TF+VM-MoA8
Surface Acoustic Wave Propagation Properties of Nitrogenated Diamond-like Carbon Films
J.Y. Kim, H.J. Chung, H.J. Kim, Seoul National University, Korea, H.M. Cho, H.K. Yang, J.C. Park, Korea Electronics Technology Institute
4:40pm TF+VM-MoA9
High Deposition Rate Diamondlike Carbon Films Deposited using Permanenet Magnet Electron Cyclotron Resonance Plasmas
C. Doughty, J.B. Bailey, ASTeX PlasmaQuest
5:00pm TF+VM-MoA10
Polymerization in Remote Hydrocarbon Deposition Plasmas
A. de Graaf, M.F.A.M. van Hest, M.C.M. van de Sanden, K.G.Y. Letourneur, D.C. Schram, Eindhoven University of Technology, The Netherlands