AVS 46th International Symposium
    Thin Films Division Monday Sessions
       Session TF+VM-MoA

Paper TF+VM-MoA5
Preparation and Properties Enhancement of Silicon Carbonitride Films Using Reactive Magnetron Sputtering

Monday, October 25, 1999, 3:20 pm, Room 620

Session: Advances in Hard and Superhard Coatings II
Presenter: M. Nastasi, Los Alamos National Laboratory
Authors: X.-M. He, Los Alamos National Laboratory
K.C. Walter, Los Alamos National Laboratory
M. Nastasi, Los Alamos National Laboratory
Correspondent: Click to Email
Silicon carbonitride (Si(C,N)) films were synthesized on Si (100) and metal substrates by reactive d.c. magnetron sputtering with Ar as the sputtering gas and N@sub 2@ as the reactive gas. The composition and properties of the films were studied with respect to the influences of the bias voltage applied to substrates, the deposition temperature, and the gas flow ratio of N@sub 2@ to Ar (or F@sub N2@/F@sub Ar@). The Si(C,N) mechanical properties, hardness, fracture, and tribological properties, were observed to be highly depended on the processing conditions such as substrate temperature, the arrival ratios of ion to deposition atom, J@sub i@/J@sub a@, the negative bias voltage and F@sub N2@/F@sub Ar@. Under optimum conditions amorphous coatings with high wear resistance and harnesses as high as 40 GPa were prepared. The role of synthesis parameters on the structure, compositions, and mechanical properties will be discussed in detail.