| AVS 46th International Symposium | |
| Plasma Science and Technology Division | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS-TuA1 Invited Paper Infrared and Microwave Absorption Diagnostics of Plasmas for Silicon Oxide Etching and Deposition R.C. Woods, University of Wisconsin, Madison |
| 2:40pm | PS-TuA3 Thomson Scattering with Gated Intensified CCD Detectors for Diagnostic of rf Discharge Plasmas S.A. Moshkalyov, T. Morrow, C. Thompson, W. Graham, Queen's University of Belfast, Northern Ireland, UK |
| 3:00pm | PS-TuA4 Determination of Electron Temperatures and Species Concentrations During Aluminum Etching V.M. Donnelly, M.V. Malyshev, S.W. Downey, J.I. Colonell, N. Layadi, Bell Laboratories, Lucent Technologies |
| 3:20pm | PS-TuA5 Invited Paper Peter Mark Memorial Award Address E.S. Aydil, University of California, Santa Barbara |
| 4:00pm | PS-TuA7 Cavity Ring Down Spectroscopy for the Detection of Hydrocarbon Radicals during a-C:H Deposition K.G.Y. Letourneur, M.C.M. van de Sanden, R. Engeln, M.G.H. Boogaarts, D.C. Schram, Eindhoven University of Technology, The Netherlands |
| 4:20pm | PS-TuA8 Characterization of Transformer Coupled Oxygen Plasmas by Trace Rare Gas-Optical Emission Spectroscopy and Langmuir Probe Analysis N.C.M. Fuller, Bell Laboratories, Lucent Technologies and Columbia University, M.V. Malyshev, V.M. Donnelly, Bell Laboratories, Lucent Technologies, I.P. Herman, Columbia University |
| 4:40pm | PS-TuA9 Diagnostics of Large-area Plasma Produced by Surface Waves on a Metal Wall with Periodicity T. Yamauchi, K. Aoki, Toshiba Corporation, Japan, H. Sugai, Nagoya University, Japan |
| 5:00pm | PS-TuA10 UV Absorption Spectroscopy of Pulsed Fluorocarbon Plasmas B.A. Cruden, K.K. Gleason, H.H. Sawin, Massachusetts Institute of Technology |