| AVS 46th International Symposium | |
| Plasma Science and Technology Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | PS-ThM1 Theoretical Analysis of the Interactions of Chemically Reactive Clusters from Silane Plasmas with Crystalline and Amorphous Silicon Surfaces S. Ramalingam, E.S. Aydil, D. Maroudas, University of California, Santa Barbara, W.M.M. Kessels, Eindhoven University of Technology, The Netherlands |
| 8:40am | PS-ThM2 Hydrogen Atom Reactions in a-SiC:H Film Growth M.-S. Lee, S.F. Bent, Stanford University |
| 9:00am | PS-ThM3 An In Situ Study of Plasma Deposition of Hydrogenated Amorphous Silicon Using Multiple Total Internal Reflection Infrared Spectroscopy D.C. Marra, University of California, Santa Barbara, W.M.M. Kessels, Eindhoven University of Technology, The Netherlands, B.F. Hanyaloglu, E.S. Aydil, University of California, Santa Barbara |
| 9:20am | PS-ThM4 Plasma and Surface Chemistry in a Remote Silane Plasma Studied By Various Diagnostics and Related to a-Si:H Film Quality W.M.M. Kessels, M.C.M. van de Sanden, A.H.M. Smets, B.A. Korevaar, D.C. Schram, Eindhoven University of Technology, The Netherlands |
| 9:40am | PS-ThM5 Competition Between Etching and Deposition in Methane/Hydrogen Plasma Interactions with the Si(100) Surface H.L. Duan, S.F. Bent, Stanford University |
| 10:00am | PS-ThM6 A Multi-dimensional Model for an Inductively Coupled Ar/C@sub 4@F@sub 8@ Discharge S. Rauf, P.L.G. Ventzek, V. Arunachalam, D.G. Coronell, Motorola Inc. |
| 10:20am | PS-ThM7 Inorganic Plasma Low-k Materials - Aurora 2.7 - N. Matsuki, Y. Morisada, Y. Naito, A. Matsunoshita, ASM Japan K.K. |
| 10:40am | PS-ThM8 Plasma Modification of Polymeric Membranes M.L. Steen, E.R. Fisher, N.E. Capps, E.D. Havey, Colorado State University |
| 11:00am | PS-ThM9 Polymer Surfaces Modified Using RF Plasma D.A. Steele, R.D. Short, University of Sheffield, UK, D. Barton, J.W. Bradley, UMIST, UK |