| AVS 46th International Symposium | |
| Plasma Science and Technology Division | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS-MoA1 Invited Paper Diagnostics for Insight into Fluorocarbon Plasma Chemstry H. Sugai, Nagoya University, Japan |
| 2:40pm | PS-MoA3 Comparison of Actinometric and Diode-laser Absorption Measurements of [CF] and [CF@sub 2@] in an Inductively Coupled Plasma Reactor T.M. Bauer, A. Inoue, P.-T. Ton-Nu, J.L. Cecchi, University of New Mexico |
| 3:00pm | PS-MoA4 Ion Energy Distribution Functions (IEDFs) in NF@sub3@ based Discharges with Various Diluents H. Hsueh, The Pennsylvania State University, B.S. Felker, Air Products and Chemicals, Inc., R.T. McGrath, The Pennsylvania State University, J.G. Langan, Air Products and Chemicals, Inc. |
| 3:20pm | PS-MoA5 Optical Emission Thermometry Applied to the Measurement of Neutral Gas Temperature within a High-density, Inductively-coupled Plasma Abatement Device D.B. Graves, E.J. Tonnis, M.W. Kiehlbauch, University of California, Berkeley |
| 3:40pm | PS-MoA6 Using Optical Emission Spectroscopy (OES) to Monitor Different Parameters for a Contact Hole Etch Process between Wet Clean D. Knobloch, Infineon Technologies Dresden GmbH & Co. OHG, Germany, F.H. Bell, Infineon Technologies AG, Munich, Germany, J. Zimpel, K. Voigtlaender, Fraunhofer Institute, Germany |
| 4:00pm | PS-MoA7 Radical Detection using Appearance Potential Mass Spectrometry H. Singh, J.W. Coburn, D.B. Graves, University of California, Berkeley |
| 4:20pm | PS-MoA8 C@sub 4@F@sub 8@ Dissociation Rate Control for Oxide Etch Process Plasma by Changing EEDF S. Noda, T. Tatsumi, N. Ozawa, K. Adachi, M. Okigawa, M. Sekine, Association of Super-Advanced Electronics Technologies (ASET), Japan |
| 4:40pm | PS-MoA9 Plasma and Surface Diagnostics in Cl@sub 2@/O@sub 2@ Discharges in Transformer Coupled Plasma Reactors E. Edelberg, Lam Research Corporation, S. Ullal, A. Godfrey, University of California, Santa Barbara, V. Vahedi, J.E. Daugherty, N. Benjamin, A. Perry, D. Cooperberg, R. Gottscho, Lam Research Corporation, E.S. Aydil, University of California, Santa Barbara |
| 5:00pm | PS-MoA10 Oxide Etch Studies in an Inductively Coupled GEC Reference Cell C@sub 2@F@sub 6@ Discharge using Diode Laser Spectroscopy W.L. Perry, H.M. Anderson, University of New Mexico |