| AVS 46th International Symposium | |
| Manufacturing Science and Technology Group | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | MS-WeA1 Invited Paper Micrometrology with Scanning Probes H.K. Wickramasinghe, IBM T.J. Watson Research Center |
| 2:40pm | MS-WeA3 Chemical Process Sensing using Mass Spectrometry in Multicomponent Reaction Systems Y. Xu, T. Gougousi, N. Gupta, J.N. Kidder, Jr., G.W. Rubloff, University of Maryland |
| 3:40pm | MS-WeA6 Mechanisms for the Production of Atomically Flat Surfaces Studied by Scanning Probe Microscopy@footnote 1@ S.C. Langford, R.F. Hariadi, J.T. Dickinson, Washington State University |
| 4:00pm | MS-WeA7 Investigation of Thermal Curing of an Organic Low-k Spin-on Dielectric by Variable-Angle Spectroscopic Ellipsometry F. Yang, W.A. McGahan, Nanometrics, Inc., C.E. Mohler, L.M. Booms, The Dow Chemical Company |
| 4:20pm | MS-WeA8 Assessment of Quadrupole Mass Spectrometry as an In Situ HDP-CVD Process Diagnostic Technique J.A.B. Van Hoeymissen, IMEC, Belgium, C. Hughes, BOC Edwards industrial resident at IMEC, Belgium, M. Heyns, IMEC, Belgium |
| 4:40pm | MS-WeA9 Determining Ion Flux and Ion Energy from Radio-Frequency Current and Voltage Measurements M.A. Sobolewski, National Institute of Standards and Technology |
| 5:00pm | MS-WeA10 Linking Process and Structure using Automated Analysis of AFM Images D.A. Chernoff, D.L. Burkhead, C.S. Cook, Advanced Surface Microscopy, Inc. |