AVS 46th International Symposium
    The Science of Micro-Electro-Mechanical Systems Topical Conference Thursday Sessions

Session MM+MI-ThM
Processing and Integration Technology

Thursday, October 28, 1999, 8:20 am, Room 620
Moderator: L.M. Miller, Jet Propulsion Laboratory


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

9:00am MM+MI-ThM3 Invited Paper
Magnetic Micromachining Technology: From Materials to Components to Actuators
M.G. Allen, Georgia Institute of Technology
10:20am MM+MI-ThM7
Fabrication and Characterization of Polycrystalline Silicon Thin Films with Hydrofluoric Acid Permeability for Sacrificial Etching of Underlying Oxide Layers
Y. Kageyama, T. Tsuchiya, H. Funabashi, J. Sakata, Toyota Central R&D Labs., Inc., Japan
10:40am MM+MI-ThM8
A New Chemistry for Rapid Etching of SiO@sub2@
C.I.H. Ashby, C.M. Matzke, L. Griego, Sandia National Laboratories
11:00am MM+MI-ThM9
Residual Stress Characterization of Thick PECVD Oxide Films for MEMS Applications
R. Ghodssi, X. Zhang, K.-S. Chen, K.A. Lohner, M. Spearing, M.A. Schmidt, Massachusetts Institute of Technology
11:20am MM+MI-ThM10
Process and Fabrication of a Thin Film PZT Pressure Sensor
E. Zakar, M. Dubey, B. Piekarski, J. Conrad, R. Piekarz, R. Widuta, Army Research Lab
11:40am MM+MI-ThM11
Microfabricated Low-Power Broad-Band Light Source Utilizing Tungsten Filaments
E.W. Jones, T. George, JPL-California Institute of Technology, M.L. Tuma, NASA-Glenn Research Center, R. Hansler, Lighting Innovations-John Carroll University