AVS 46th International Symposium | |
The Science of Micro-Electro-Mechanical Systems Topical Conference | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
9:00am | MM+MI-ThM3 Invited Paper Magnetic Micromachining Technology: From Materials to Components to Actuators M.G. Allen, Georgia Institute of Technology |
10:20am | MM+MI-ThM7 Fabrication and Characterization of Polycrystalline Silicon Thin Films with Hydrofluoric Acid Permeability for Sacrificial Etching of Underlying Oxide Layers Y. Kageyama, T. Tsuchiya, H. Funabashi, J. Sakata, Toyota Central R&D Labs., Inc., Japan |
10:40am | MM+MI-ThM8 A New Chemistry for Rapid Etching of SiO@sub2@ C.I.H. Ashby, C.M. Matzke, L. Griego, Sandia National Laboratories |
11:00am | MM+MI-ThM9 Residual Stress Characterization of Thick PECVD Oxide Films for MEMS Applications R. Ghodssi, X. Zhang, K.-S. Chen, K.A. Lohner, M. Spearing, M.A. Schmidt, Massachusetts Institute of Technology |
11:20am | MM+MI-ThM10 Process and Fabrication of a Thin Film PZT Pressure Sensor E. Zakar, M. Dubey, B. Piekarski, J. Conrad, R. Piekarz, R. Widuta, Army Research Lab |
11:40am | MM+MI-ThM11 Microfabricated Low-Power Broad-Band Light Source Utilizing Tungsten Filaments E.W. Jones, T. George, JPL-California Institute of Technology, M.L. Tuma, NASA-Glenn Research Center, R. Hansler, Lighting Innovations-John Carroll University |