AVS 46th International Symposium
    Applied Surface Science Division Thursday Sessions

Session AS-ThM
Real World Surface Analysis

Thursday, October 28, 1999, 8:20 am, Room 6A
Moderator: T. Barr, University of Wisconsin, Millwaukie


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

9:00am AS-ThM3 Invited Paper
The Real World: Surface Analysis Applications and Innovations in Industry
S.J. Pachuta, 3M
9:40am AS-ThM5
Effect of Sputtering Gas on Cleaning Al-Based Intermetallics and the Determination of Surface Compositions based on Auger Analysis
C.J. Jenks, T.E. Bloomer, M.J. Kramer, Ames Laboratory, J.W. Burnett, Iowa State University, D.W. Delaney, T.A. Lograsso, M.F. Besser, D.J. Sordelet, P.A. Thiel, Ames Laboratory
10:00am AS-ThM6
Failure Mechanisms of Adhesively Bonded Hot Dipped Galvanised Steel Studied by Small Area XPS
R.G. White, VG Scientific, UK, M.F. Fitzpatrick, J.F. Watts, University of Surrey, UK
10:20am AS-ThM7
Novel X-ray Sensor Suite for In Situ Optimization of Thin Film Architectures
L.L. Fehrenbacher, D. Palaith, C. Deaton, J. Ullrich, Technology Assessment & Transfer, Inc.
10:40am AS-ThM8
A 300mm SAM, with EDX and FIB for Full Wafer Defect and Thin Film Characterization
Y. Uritsky, C.R. Brundle, Applied Materials, Inc.
11:00am AS-ThM9
A Study of the Surface Chemistry and Physical Properties Related to Adhesion of the Polyimide Passivation Layer by XPS, FTIR, and Contact Angle Measurements
T. Jiang, C.A, Bradbury, Micron Technology Inc., M. Canavan, Micron Technology Inc
11:20am AS-ThM10
Diffusion of Large Molecules on Metallic Surfaces using TOFSIMS
R. Avci, S.E. Maccagnano, Montana State University, G.L. Gresham, G.S. Groenewold, Idaho National Engineering and Environmental Laboratory
11:40am AS-ThM11
Identification of Surface Chemical Functional Groups in Reverse Osmosis Membranes: An X-ray Photoelectron Spectroscopy Study
S.D. Beverly, S. Seal, S.K. Hong, University of Central Florida