AVS 46th International Symposium
    Applied Surface Science Division Thursday Sessions
       Session AS-ThM

Paper AS-ThM7
Novel X-ray Sensor Suite for In Situ Optimization of Thin Film Architectures

Thursday, October 28, 1999, 10:20 am, Room 6A

Session: Real World Surface Analysis
Presenter: L.L. Fehrenbacher, Technology Assessment & Transfer, Inc.
Authors: L.L. Fehrenbacher, Technology Assessment & Transfer, Inc.
D. Palaith, Technology Assessment & Transfer, Inc.
C. Deaton, Technology Assessment & Transfer, Inc.
J. Ullrich, Technology Assessment & Transfer, Inc.
Correspondent: Click to Email
Advances in compact, high energy x-ray sources and sensitive detectors are creating new opportunities for the use of x-rays for real time and near real time interrogation of thin film properties. A design approach that combines x-ray diffraction, florescence and reflectivity measurements with a thin film deposition system is described. Phase, composition, surface and interfacial roughness, thickness and density of thin films can now be monitored during a thin film deposition process enabling improved control over process deposition parameters. Details of the equipment and examples of the systems used for rapid development of new multilayer thin film architectures as well as production control are provided.