AVS 46th International Symposium
    Nanometer-scale Science and Technology Division Wednesday Sessions
       Session NS-WeP

Paper NS-WeP8
Fabrication of a Nanosize Metal Aperture for NSOM Sensor using PR Removal and Sputtering Techniques

Wednesday, October 27, 1999, 5:30 pm, Room 4C

Session: Poster Session
Presenter: S.S. Choi, Sun-Moon University, Korea
Authors: M.Y. Jung, Yonsei University, Korea
I.W. Lyo, Yonsei University, Korea
S.S. Choi, Sun-Moon University, Korea
Correspondent: Click to Email
The scanning near-field optical microscopy(NSOM) can be used for imaging on a nanometer scale and identifying individual molecules with capability to surpass the resolution-limiting diffraction of conventional optical methods.@footnote 1@ In order to obtain better resolution limit, the diameter of the thin metal aperture has to be less than the optical wavelength. The fabricated nanosize Si tip using RIE have been thermally evaporated with a Au or Cr metal thin film. In order to have an aperture with diameter less than 100nm on top of the tip, several methods have been applied including sputtering and photoresist-stripping techniques.@footnote 2@ We have successfully fabricated the metal aperture with diameter less than ~0.3 nm on the silicon nitride tip. @FootnoteText@@footnote 1@ R.C. Davis, C.C. Williams and P. Neuzil, Appl. Phys. Lett. 66(1995) 2309. @footnote 2@M.Y. Jung, I.W. Lyo, S.S. Choi, MNE98, Sept.15-21, Leuven, Belgium. .