| AVS 45th International Symposium | |
| Thin Films Division | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | TF-MoA1 Computer Simulation Modeling of Sculptured Thin Films V.C. Venugopal, R. Messier, Pennsylvania State University |
| 2:20pm | TF-MoA2 Characterization of TiN/CN@sub x@ Multilayers Deposited by DC Magnetron Sputtering M.M. Lacerda, Y.H. Chen, Northwestern University, W.C. Chan, University of Hong Kong, China, B. Zhou, Y.W. Chung, Northwestern University |
| 2:40pm | TF-MoA3 Characterization of Stress-Morphology Relationships in Sculptured Thin Films (STFs) R.A. Knepper, D.E. Fahnline, R. Messier, Pennsylvania State University |
| 3:00pm | TF-MoA4 Invited Paper Mechanical Properties Measurements using Scanning Force Microscopy W.N. Unertl, University of Maine |
| 3:40pm | TF-MoA6 Meso-Scale Contact Hardness, Friction, and Wear of Aluminum Oxynitride Films S.D. Dvorak, G.P. Bernhardt, O.D. Greenwood, R.J. Lad, University of Maine |
| 4:00pm | TF-MoA7 Nanotribology of Single Crystal ZnO Surfaces: Relation of Atomic Level Friction to Macro Tribology of Thin Films J.J. Nainaparampil, J.S. Zabinski, S.V. Prasad, Air Force Research Laboratory |
| 4:20pm | TF-MoA8 Surface Stress in Silicon Oxide Layer made by Plasma Oxidation with Applying Sample Bias A.N. Itakura, National Research Institute for Metals, Japan, T. Kurashina, T. Narushima, University of Tsukuba, Japan, M. Kitajima, National Research Institute for Metals, Japan |
| 4:40pm | TF-MoA9 Stress Alignment in SiO@sub 2@ Thin Films Deposited on Thin Chromium and Aluminum Film K.E. Coulter, V. Raksha, Flex Products, Inc. |
| 5:00pm | TF-MoA10 Investigation of Induced Recrystallization and Stress in Close-Spaced Sublimation CdTe Thin Films H.R. Moutinho, R.G. Dhere, M.M. Al-Jassim, P. Sheldon, National Renewable Energy Laboratory, B.T. Mayo, Southern University, L.L. Kazmerski, National Renewable Energy Laboratory |