| AVS 45th International Symposium | |
| Plasma Science and Technology Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS-ThA1 Invited Paper In Situ Surface Diagnostics in Plasma Processing: Present Status and Future Challenges E.S. Aydil, University of California, Santa Barbara |
| 2:40pm | PS-ThA3 Comparison of Surface Wave Plasma with ICP used in Oxide Etching H. Kokura, S. Yoneda, K. Nakamura, Nagoya University, Japan, N. Matsumoto, Sumitomo Metal In., Ltd., Japan, M. Nakamura, Fujitsu Ltd., Japan, H. Sugai, Nagoya University, Japan |
| 3:00pm | PS-ThA4 An ICP Source Design with Improved Azimuthal Symmetry@footnote 1@ M.H. Khater, L.J. Overzet, University of Texas, Dallas, B.E. Cherrington, University of Dayton |
| 3:20pm | PS-ThA5 Characterization of 100 MHz Inductively Coupled Plasma (ICP) by Comparison with 13.56 MHz ICP H. Nakagawa, S. Morishita, S. Noda, M. Okigawa, M. Inoue, M. Sekine, Association of Super-Advanced Electronics Technologies (ASET), Japan |
| 3:40pm | PS-ThA6 Multi-Frequency Operation of RIE and ICP Sources@footnote 1@ S. Rauf, M.J. Kushner, University of Illinois, Urbana-Champaign |
| 4:00pm | PS-ThA7 Diagnostics in a Novel Capacitively Shielded, Inductively Coupled Plasma Source V.A. Shamamian, J.E. Butler, D. Leonhardt, J.L. Giuliani, Naval Research Laboratory |
| 4:20pm | PS-ThA8 Volume/Surface Effects on Dissociation Processes in Ar/C@sub 4@F@sub 8@ Plasma K. Kinoshita, Association of Super-Advanced Electronics Technologies (ASET), Japan, S. Morishita, S. Noda, M. Okigawa, M. Inoue, M. Sekine, ASET, Japan |
| 4:40pm | PS-ThA9 Investigation of the Gasphase of Expanding Ar/C@sub x@H@sub y@ Plasmas A. de Graaf, M.F.A.M. van Hest, K.G.Y. Letourneur, M.C.M. van de Sanden, D.C. Schram, Eindhoven University of Technology, The Netherlands |
| 5:00pm | PS-ThA10 Electrical Control of Spatial Uniformity of Chamber-Cleaning Plasmas Investigated using Planar Laser-Induced Fluorescence K.L. Steffens, M.A. Sobolewski, National Institute of Standards and Technology |