| AVS 45th International Symposium | |
| Partial Pressure Measurements and Process Control Topical Conference | Friday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | PC-FrM1 Invited Paper Challenges for Real-Time Control in Reactive Semiconductor Manufacturing Process Environments G.W. Rubloff, University of Maryland |
| 9:00am | PC-FrM3 Reaction Analysis and Rate Metrology of Selective Area Silicon PECVD using In-Situ Real-time Mass Spectroscopic Sensing and Mass Balance Modeling A.I. Chowdhury, T.M. Klein, G.N. Parsons, North Carolina State University |
| 9:20am | PC-FrM4 Sensor Integration on a W-CVD Cluster Tool for Real-Time Process Monitoring and Control J.N. Kidder, Jr., Y. Xu, N. Gupta, T. Gougousi, G.W. Rubloff, University of Maryland |
| 10:00am | PC-FrM6 In situ Measurement of Moisture Contamination in Reactive Process Atmospheres J.J.F. McAndrew, R.S. Inman, D. Znamensky, Air Liquide, J.-M. Girard, Air Liquide, France, G. Goltz, France Telecom, J.-M. Flan, SGS-Thomson, France |
| 10:20am | PC-FrM7 Invited Paper RGA Process Monitoring in Semiconductor Manufacturing J.M. Baker, IBM T.J. Watson Research Center |
| 11:00am | PC-FrM9 Invited Paper Process Monitoring of Chemical Vapor Deposition Systems by In-situ Gas Analysis B. Lu, E. Baker, Novellus Systems, Inc. |