AVS 45th International Symposium
    Partial Pressure Measurements and Process Control Topical Conference Friday Sessions
       Session PC-FrM

Invited Paper PC-FrM9
Process Monitoring of Chemical Vapor Deposition Systems by In-situ Gas Analysis

Friday, November 6, 1998, 11:00 am, Room 317

Session: Process Monitoring and Control
Presenter: B. Lu, Novellus Systems, Inc.
Authors: B. Lu, Novellus Systems, Inc.
E. Baker, Novellus Systems, Inc.
Correspondent: Click to Email
Chemical vapor deposition (CVD) is a key technology for both interconnection and front-end wafer processing in advanced IC fabrication. CVD systems present a challenge for process state monitoring due to the inherent complexity of the process chemistry involved. When combined with other process knowledge, in-situ gas analysis using mass spectrometry (typically referred to as RGA) can provide real-time information representing the process chemical composition, process sequence, and equipment status. Consequently, such process monitoring tools can aid significantly in the continuous improvement and new product development of semiconductor processes and process equipment. Several applications will be presented to illustrate the use of a properly configured mass spectrometer on CVD process systems for (1) rapid learning of process chemistry and process state, (2) verification of system design improvement, and (3) optimization of loadlock operation to eliminate residual air contamination. We will also discuss some of the current obstacles that must be overcome in the use of mass spectrometer as a "full-time" process state sensor.