AVS 45th International Symposium
    Thin Films Division Monday Sessions
       Session TF-MoP

Paper TF-MoP24
The Analysis of Silicon Oxynitrides with Spectroscopic Ellipsometry and Auger Spectroscopy, Compared to Analyses by RBS, and FTIR

Monday, November 2, 1998, 5:30 pm, Room Hall A

Session: Thin Films Poster Session
Presenter: H.G. Tompkins, Motorola, Inc.
Authors: H.G. Tompkins, Motorola, Inc.
R. Gregory, Motorola, Inc.
P.W. Deal, Motorola, Inc.
S.M. Smith, Motorola, Inc.
Correspondent: Click to Email
This work addresses the issue of whether spectroscopic ellipsometry, using the effective medium approximation (SE-EMA), may be used meaningfully to analyze PECVD silicon nitride films. We use RBS and FTIR as reference methods and compare the results to the results of SE-EMA analyses and Auger analyses. The results are that Auger analysis, using properly determined sensitivity factors, gives compositions which are within the uncertainty of the reference methods. SE-EMA, on the other hand, always overestimates the oxide contribution and underestimates the nitride contribution. Probable causes are discussed.