AVS 45th International Symposium
    Thin Films Division Monday Sessions
       Session TF-MoP

Paper TF-MoP10
Stability of Transparent Conducting Oxide Films for Use at High Temperatures

Monday, November 2, 1998, 5:30 pm, Room Hall A

Session: Thin Films Poster Session
Presenter: T. Yamamoto, Kanazawa Institute of Technology, Japan
Authors: T. Minami, Kanazawa Institute of Technology, Japan
T. Miyata, Kanazawa Institute of Technology, Japan
T. Yamamoto, Kanazawa Institute of Technology, Japan
Correspondent: Click to Email
The stability of transparent conducting oxide (TCO) films in various atmospheres at high temperatures is important for applications such as transparent heaters and also in optoelectronic device fabrication processes. However, the electrical, optical and chemical properties of TCO films at high temperatures above 500 ° C have not been investigated because of the melting point of glass substrates. In this paper, we describe the stability of various TCO films at high temperatures in various atmospheres. Various TCO films consisting of binary compounds such as ZnO, In@sub 2@O@sub 3@ and SnO@sub 2@, ternary compounds such as Zn@sub 2@In@sub 2@O@sub 5@, In@sub 4@Sn@sub 3@O@sub 12@, GaInO@sub 3@, ZnSnO@sub 3@ and MgIn@sub 2@O@sub 4@ or multicomponent oxides composed of two binary compounds or two ternary compounds were tested in this work. The TCO films were deposited by magnetron sputtering on quartz substrates at room temperature or 350 ° C. The tests were carried out in various atmospheres such as air, argon gas and vacuum at temperatures up to 1000 ° C. The SnO@sub 2@, In@sub 2@O@sub 3@ and In@sub 4@Sn@sub 3@O@sub12@ thin films were found to be more stable than other materials. It can be concluded that stability at high temperatures was mainly determined by the metal elements contained in the TCO film; high stability was obtained in TCO films rich in Sn and In.