AVS 45th International Symposium
    Surface Science Division Wednesday Sessions
       Session SS2-WeA

Paper SS2-WeA6
Surface Decomposition Reaction of Trisdimethylaminoantimony on GaSb(100)-(3x1)

Wednesday, November 4, 1998, 3:40 pm, Room 309

Session: Photochemistry and Deposition
Presenter: K. Yong, University of Texas, Austin
Authors: K. Yong, University of Texas, Austin
P.D. Kirsch, University of Texas, Austin
J.G. Ekerdt, University of Texas, Austin
Correspondent: Click to Email
Trisdimethylaminoantimony (TDMASb) is a novel Sb-precursor for the deposition of Sb-containing alloys by organometallic vapor phase epitaxy. Deposition using TDMASb can lower the growth temperature and also minimize carbon incorporation in the layers. The decomposition of TDMASb on GaSb(100)-(3x1) was studied using temperature programmed desorption, temperature programmed static secondary ion mass spectroscopy, low energy electron diffraction, and X-ray photoelectron spectroscopy. TDMASb decomposes on the surface at temperatures below 200 K and dimethylamine was desorbed through two reaction pathways. Homolysis of the antimony-nitrogen bond resulted in desorption of the dimethylamine radical at 380 K. Methylmethyleneimine was formed and desorbed from the surface through hydrogen elimination at 480 K. Deposition of Sb from 5 monolayers of TDMASb on GaSb(100) induced the change of surface structure from (3x1) to (1x1). We propose that surface Sb atoms are the reactive sites for the decomposition of TDMASb.