AVS 45th International Symposium
    Nanometer-scale Science and Technology Division Monday Sessions
       Session NS+EM+SS-MoA

Paper NS+EM+SS-MoA5
X-STM Study of InAs/In@sub 1-x@Ga@sub x@Sb/InAs/AlSb Laser Structures@footnote 1@

Monday, November 2, 1998, 3:20 pm, Room 321/322/323

Session: Cross-sectional Scanning Tunneling Microscopy of Semiconductors
Presenter: W. Barvosa-Carter, Naval Research Laboratory
Authors: W. Barvosa-Carter, Naval Research Laboratory
M.J. Yang, Naval Research Laboratory
L.J. Whitman, Naval Research Laboratory
Correspondent: Click to Email

Strained-layer heterostructures involving the 6.1 Å family of III-V semiconductors (including InAs, GaSb, and AlSb) are being investigated for use in a growing number of high-speed and opto-electronic devices. Recently it was shown in InAs/In@sub 0.73@Ga@sub 0.28@Sb/InAs/AlSb mid-IR structures that the photoluminescence (PL) intensity and x-ray superlattice diffraction quality are strongly dependent on MBE growth temperature. These characteristics were shown to be optimized within a rather narrow growth temperature range (410-460°C) and much worse outside of that range. Although the quality of the interfaces in these structures is expected to play a crucial role in determining device performance, little is known about the actual atomic-scale structure of the interfaces. We present an atomic-resolution cross-sectional STM (X-STM) study of these laser structures in order to directly correlate atomic-scale features, such as interface roughness and layer intermixing, with material quality as measured by PL and x-ray measurements on the same samples. Two such laser structures have been examined, one grown at the optimum temperature and another grown at a higher temperature. Interface roughness appears to be larger in the higher temperature structure. In addition, intermixing occurs at the AlSb-on-InAs interfaces which results in electronic structure differences between the InAs-on-AlSb and AlSb-on-InAs interfaces as observed by X-STM. Based on our X-STM results, we will discuss the atomic-scale sources of device degradation, and present possible routes towards improvement of the growth of these laser structures. @FootnoteText@ @footnote 1@ Funded by the Office of Naval Research and the Air Force Research Laboratory.