AVS 45th International Symposium
    Magnetic Interfaces and Nanostructures Technical Group Wednesday Sessions
       Session MI+NS-WeA

Paper MI+NS-WeA9
Fabrication and Characterisation of Micron Scale Magnetic Features

Wednesday, November 4, 1998, 4:40 pm, Room 324/325

Session: Nanoscale Magnetics: Imaging and Fabrication
Presenter: C.N. Borca, University of Nebraska, Lincoln
Authors: C.N. Borca, University of Nebraska, Lincoln
P.A. Dowben, University of Nebraska, Lincoln
Correspondent: Click to Email
Different methods can be adopted to fabricate patterned thin films with features spatially restricted in the micron-scale regime. We are studying ferromagnetic films of cobalt and cobalt - palladium heterostructures fabricated by selective area deposition from organometalic compounds. We have developed this one-step deposition technique sufficiently to deposit pure metal features with excellent spatial resolution and in multilayer geometries. From the comparison between the continuous and patterned films we can conclude that the patterning of the films into arrays of discrete micron-scale features has a greater influence on the magnetic properties of the films than changes microstructure and film growth. We propose that this organometallic chemical vapor deposition (CVD) method represent a new approach for novel devices fabrication.