AVS 45th International Symposium
    Electronic Materials and Processing Division Thursday Sessions
       Session EM-ThP

Paper EM-ThP7
Effects of Variously Configured Magnets on the Characteristics Of Inductively Coupled Plasmas

Thursday, November 5, 1998, 5:30 pm, Room Hall A

Session: Electronic Materials and Processing Poster Session
Presenter: S.W. Hwang, SungKyunKwan University, Korea
Authors: S.W. Hwang, SungKyunKwan University, Korea
Y.J. Lee, SungKyunKwan University, Korea
S.W. Joe, Kyoungki University, Korea
K.H. Kim, Hanyang University, Korea
G.Y. Yeom, SungKyunKwan University, Korea
Correspondent: Click to Email
Although high density plasma(HDP) sources have been employed for dry etching in microelectronics, their scale-up to process larger wafer size such as the substrates used in flat panel display(FPD) technology is not that easy due to the uniformity problem over a large area wafer size. In this study, to enhance plasma uniformity and density of an inductively coupled plasma source, the effects of variously configured magnets on the characteristics of the plasmas were investigated. As the magnets, Helmholtz type axial electromagnets and multi-dipole magnets composed of 8sets of permanent magnets around the chamber wall were used. The chamber was designed as a square mainly for the FPD application such as liquid-crystal display(LCD), plasma display panel(PDP), etc. To characterize the plasmas as a function of magnetic field strengths and the combination of the magnets, electrostatic probe(Hiden Analytical Ltd.), optical emission spectroscopy(OES: SC Tech. PCM402), and quadrupole mass spectrometer(QMS: Hiden Analytical Ltd. PSM) were used. Ion density, plasma potential, and electron temperature were measured along the chamber diameter and axial direction for Ar and Cl@sub 2@/HBr gas combinations using the electrostatic probe. The results showed that high density plasma(10@super 11@-10@super 12@/cm@super 3@) with excellent uniformity(@<=@3%) near the wafer surface could be achieved along the chamber diameter by the combination of the axial magnets and multi-dipole magnets. Optical emission spectra and mass spectra (positive and negative ions, radicals, and neutrals) were also studied as a function of axial magnetic strengths and with/without multi-dipole magnets for Cl@sub 2@/HBr gas combinations, and showed enhanced ionization and dissociation with the combined magnets. We believe that a suitable combination of axial magnets and multi-dipole magnets would also improve etch uniformities and etch rates of the large size wafers used in FPD.