AVS 45th International Symposium
    Applied Surface Science Division Monday Sessions
       Session AS-MoM

Invited Paper AS-MoM1
Synchrotron Based Low Z Materials Analysis

Monday, November 2, 1998, 8:20 am, Room 307

Session: Materials Analysis (including Small Dimensions and Synchrotron)
Presenter: D.A. Fischer, National Institute of Standards and Technology
Correspondent: Click to Email
A new soft-x-ray (C,N,O,F) materials science end station to study the structure and chemical nature of diverse materials at the National Synchrotron Light Source has been designed, built and commissioned. Practical industrial problems, are currently being investigated, such as model catalyst systems, polymer surfaces and their interfaces, hard disk lubricant chemistry, self assembled monolayers and high Tc super conducting tapes. This presentation will describe the Dow / NIST soft x-ray materials characterization facility and review the on going NEXAFS research from a scientific and practical perspective. The experimental station, which delivers state-of-the-art intensity, resolution, and detection sensitivity is the result of a collaboration between NIST, The Dow Chemical Co., Brookhaven National Laboratory, and NIST Small Business Innovation Research (SBIR) awardees, International Radiation Detectors and Osmic Inc. Polarized ultra soft x-rays from the newly configured and upgraded NSLS U7A beamline are utilized as a search light for chemical bond identification, quantification, and orientation via the NEXAFS technique. Utilizing electron and fluorescence detection methods the surface (5nm) and bulk (200nm) structure and chemistry can be compared and contrasted simultaneously.