AVS 45th International Symposium
    Applied Surface Science Division Wednesday Sessions
       Session AS+BI+SS-WeM

Paper AS+BI+SS-WeM6
New Preparation Methods for Self Assembly of Alkanethiolates on III-V Semiconductor Surfaces

Wednesday, November 4, 1998, 10:00 am, Room 307

Session: Organized Molecular Monolayers
Presenter: C.K. Mars, Pennsylvania State University
Authors: C.K. Mars, Pennsylvania State University
D.L. Allara, Pennsylvania State University
Correspondent: Click to Email
The ability to control the chemical composition of III-V surfaces is vital in semiconductor technology. Alkanethiolate monolayers prepared from thiol melts at temperatures near 100°C have been shown to mimic the improved electronic passivation properties seen on III-V semiconductors with Na@sub 2@S and NH@sub 4@S@sub x@ treatments. We have developed a new process by which these films can be grown reliably in a highly organized state from millimolar ethanol solutions near 50°C. In addition, by adding controlled amounts of base to these solutions, the degree of organization as determined by IR spectroscopy and contact angle measurements, can further be improved. This new process has allowed us to deposit a wide variety of films including aromatic and functionalized molecules as well as layers anchored by other chalcogenide elements.