AVS 64th International Symposium & Exhibition | |
Surface Science Division | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
3:00pm | SS+HC+NS-WeA3 Invited Paper Quantum Molecular Machines Saw-Wai Hla, Ohio University and Argonne National Laboratory |
4:20pm | SS+HC+NS-WeA7 Collective, Multi-atom Diffusion in Epitaxially Grown Metallic Films Matt Hershberger, M. Hupalo, P.A. Thiel, Iowa State University Ames Laboratory –USDOE, M.K.L. Man, M.S. Altman, Hong Kong University of Science and Technology, Hong Kong, C.H. Mullet, S. Chiang, University of California-Davis, M.C. Tringides, Iowa State University Ames Laboratory –USDOE |
4:40pm | SS+HC+NS-WeA8 Quantitative Molecular Beam Study for CO2 Hydrogenation on Cu (111) and Cu(100) Surfaces Jiamei Quan, T. Kondo, T. Kozarashi, T. Mogi, J. Nakamura, University of Tsukuba, Japan |
5:00pm | SS+HC+NS-WeA9 Invited Paper A New Approach for Controlling the Rotational Orientation of a Molecule and Studying the Stereodynamics of a Molecule-Surface Collision Gil Alexandrowicz, Technion – Israel Institute of Technology, Israel |
5:40pm | SS+HC+NS-WeA11 Surface Temperature Effects in CH4 Dissociation on Flat and Stepped Nickel Single Crystals Eric High, E.K. Dombrowski, A.L. Utz, Tufts University |
6:00pm | SS+HC+NS-WeA12 Experimental and Theoretical Study of Rotationally Inelastic Diffraction of H2(D2) from Methyl-Terminated Si(111) Kevin Nihill, Z.M. Hund, University of Chicago, A. Muzas, C. Diaz, M. del Cueto, Universidad Autónoma de Madrid, Spain, T. Frankcombe, University of New South Wales, Australia, N. Plymale, N.S. Lewis, California Institute of Technology, F. Martin, Universidad Autónoma de Madrid, Spain, S.J. Sibener, University of Chicago |