| AVS 64th International Symposium & Exhibition | |
| Advanced Surface Engineering Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | SE+PS+SS-ThM1 Invited Paper Key Features of Reactive High Power Impulse Magnetron Sputtering Daniel Lundin, CNRS/Paris-Sud University, France |
| 8:40am | SE+PS+SS-ThM3 Depositions of Al2O3 Coatings by HiPIMS via Closed-loop Control using a Plasma Emission Monitoring Sensor Jianliang Lin, R. Wei, K. Coulter, Southwest Research Institute, F. Papa, Gencoa Ltd. |
| 9:00am | SE+PS+SS-ThM4 The Influence of Spokes on Spatial and Energy Distributions of Ions in Magnetron Sputtering Discharges Matjaz Panjan, Jozef Stefan Institute, Slovenia, K. Tanaka, R. Franz, A. Anders, Lawrence Berkeley National Laboratory |
| 9:20am | SE+PS+SS-ThM5 Silicon Nitride Deposition for Organic Electronics by VHF (162MHz)- PECVD G.Y. Yeom, KiHyun Kim, K.S. Kim, Y.J. Ji, J.S. Oh, Sungkyunkwan University, Republic of Korea |
| 9:40am | SE+PS+SS-ThM6 Printed Circuit Board Assembly- an Ensemble of Different Surface Energy Components and their Surface Modification Shailendra Vikram Singh, S. Woollard, G. Aresta, A.S. Brooks, G. Hennighan, R&D Semblant Limited |
| 11:00am | SE+PS+SS-ThM10 Invited Paper Plasma Surface Engineering of Biomaterials Paul K. Chu, City University of Hong Kong, Hong Kong |
| 12:00pm | SE+PS+SS-ThM13 Tuning the Properties of Plasma Polymer Varying the Substrate Temperature: a Step Toward the Fabrication of Micro/nano Pattern Damien Thiry, University of Mons, Belgium, N. Vinx, F.J. Aparicio, University of Mons, T. Godfroid, S. Deprez, Materia Nova, R. Snyders, University of Mons, Belgium |