AVS 64th International Symposium & Exhibition
    Plasma Science and Technology Division Thursday Sessions

Session PS-ThM
Plasma Sources

Thursday, November 2, 2017, 8:00 am, Room 22
Moderators: Rebecca Anthony, Michigan State University, David Ruzic, University of Illinois at Urbana-Champaign


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am PS-ThM1
New Plasma Source Generating High Radical Flux With Low Ion and Photon Flux
Y. Pilloux, David Lishan, M. Segers, Plasma-Therm LLC
8:20am PS-ThM2
Towards Plug-and-Play Tailored Voltage Waveform Plasma Sources: Progress in Matching and Calibration
Erik V. Johnson, LPICM, Ecole Polytechnique, France, K. Yamaki, LPP-CNRS, J.-P. Booth, LPP-CNRS, Ecole Polytechnique, France
8:40am PS-ThM3
Selective Radical Production in Remote Plasma Sources
Shuo Huang, University of Michigan, V. Volynets, S. Lee, S. Nam, S. Lu, Samsung Electronics Co. Ltd., Republic of Korea, M.J. Kushner, University of Michigan
9:00am PS-ThM4
On Electron Heating in Magnetron Sputtering Discharges
Jon Tomas Gudmundsson, University of Iceland, D. Lundin, Université Paris-Sud, France, M.A. Raadu, KTH-Royal Institute of Technology, Sweden, T.M. Minea, Université Paris-Sud, France, N. Brenning, KTH-Royal Institute of Technology, Sweden
9:20am PS-ThM5 Invited Paper
High-Density Plasma Generation in Low-Pressure Metamaterial Space
Osamu Sakai, The University of Shiga Prefecture, Japan
11:00am PS-ThM10
Optical Emission Spectroscopy of a Spark-coupled Laser Aluminum Plasma for Multicharged Ion Generation
Md Mahmudur Rahman, O. Balki, M. Shaim, H.E. Ali, Old Dominion University
11:40am PS-ThM12 Invited Paper
Effect of Secondary Electrons on the Ionization Dynamics and Control of Ion Properties in Electronegative Capacitive Discharges
Aranka Derzsi, Wigner Research Centre for Physics, Hungarian Academy of Sciences, Hungary