| AVS 64th International Symposium & Exhibition | |
| Plasma Science and Technology Division | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 1:40pm | PS+AS+SS-MoA1 Exploring the Gas-Surface Interface in NxOy Plasma Surface Modification of Zeolite Materials for Environmental Applications Angela Hanna, E.R. Fisher, Colorado State University |
| 2:00pm | PS+AS+SS-MoA2 Effects of Ion induced Damages on Etching Characteristics of ITO Thin Films Hu Li, K. Karahashi, Osaka University, Japan, M. Fukasawa, A. Hirata, K. Nagahata, T. Tatsumi, Sony Semiconductor Solutions Corporation, Japan, S. Hamaguchi, Osaka University, Japan |
| 2:20pm | PS+AS+SS-MoA3 Nitriding Process for Next-generation Semiconductor Devices by VHF (162 MHz) Plasma Source YouJin Ji, K.S. Kim, K.H. Kim, G.Y. Yeom, Sungkyunkwan University, Republic of Korea |
| 2:40pm | PS+AS+SS-MoA4 Defect Generation in Graphene Films by Low-Pressure Inductively Coupled Argon Plasmas Treatments X. Glad, P. Vinchon, S. Boivin, G. Robert-Bigras, Luc Stafford, Université de Montréal, Canada |
| 3:00pm | PS+AS+SS-MoA5 The Role of Plasma Species and Sample Composition on Dense Amorphous Carbon Layer Formation and Polymer Etching Behavior Adam Pranda, S.A. Gutierrez-Razo, Z. Tomova, J.T. Fourkas, G.S. Oehrlein, University of Maryland, College Park |
| 3:20pm | PS+AS+SS-MoA6 Control of Ion Energy Distributions on Insulating Surfaces Tyler List, T. Ma, V.M. Donnelly, D.J. Economou, University of Houston |
| 4:00pm | PS+AS+SS-MoA8 Ultra-high Si3N4 to SiO2 Selective Etching by Fluorocarbon Based Remote Plasma Chen Li, University of Maryland, College Park, T. Hofmann, K. Edinger, Carl Zeiss SMT GmbH, G.S. Oehrlein, University of Maryland, College Park |
| 4:20pm | PS+AS+SS-MoA9 Effect of Temporal Variation of Discharge on Photon-induced Interface Defects in Pulse-modulated Inductively Coupled Plasma Yasufumi Miyoshi, M. Fukasawa, K. Nagahata, Sony Semiconductor Solutions Corporation, Japan, K. Ishikawa, M. Sekine, M. Hori, Nagoya University, Japan, T. Tatsumi, Sony Semiconductor Solutions Corporation, Japan |
| 4:40pm | PS+AS+SS-MoA10 Invited Paper Surface Mechanisms on Dielectric Surfaces Exposed to Low Pressure Glow Discharge and Atmospheric Pressure Plasma Jets Olivier Guaitella, A.S. Morillo-Candas, Ecole Polytechnique - CNRS, France, A. Sobota, Eindhoven University of Technology, The Netherlands, E. Slikboer, D. Marinov, Ecole Polytechnique - CNRS, France, B. Klarenaar, R. Engeln, Eindhoven University of Technology, The Netherlands, V. Guerra, Instituto Superior Tecnico, Lisbon, Portugal |