| AVS 64th International Symposium & Exhibition | |
| Electronic Materials and Photonics Division | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:20pm | EM+SS-TuA1 Selective Atomic Layer Deposition of MoSix on Si (001) in Preference to Silicon Nitride and Silicon Oxide JongYoun Choi, C.F. Ahles, University of California, San Diego, R. Hung, N. Kim, Applied Materials, Inc., A.C. Kummel, University of California, San Diego |
| 3:00pm | EM+SS-TuA3 Invited Paper Interface and Border Traps, their Passivation and the Reliability of Alumina Dielectric / Indium Gallium Arsenide Gate Stacks Paul McIntyre, Stanford University |
| 4:20pm | EM+SS-TuA7 Controlling GaAs and Si Oxide Surface Energies Karen L Kavanagh, Simon Fraser University, Canada, N. Herbots, A. Brimhall, R. Van Haren, Y.W. Pershad, S. Suhartono, E. Landeros, R.J. Culbertson, Arizona State University, R. Islam, Cactus Materials |
| 4:40pm | EM+SS-TuA8 In Situ Si3N4 Surface Layer on GaN-on-Si Heterostructure for High Power Operation Chien-Fong Lo, O. Laboutin, X. Gao, C.K. Kao, H. Marchand, W. Johnson, R. Pelzel, IQE |
| 5:00pm | EM+SS-TuA9 In-Vacuo Studies of Surface Structure and Surface Chemistry During Plasma-Assisted Atomic Layer Epitaxial Growth of InN Thin Films on GaN Substrates Samantha Rosenberg, ASEE (residing at NRL), D.J. Pennachio, University California Santa Barbara, V.R. Anderson, ASEE (residing at NRL), N. Nepal, U.S. Naval Research Laboratory, C. Wagenbach, Boston University, A.C. Kozen, ASEE (residing at NRL), Z.R. Robinson, SUNY Brockport, J.A. Logan, S. Choi, University California Santa Barbara, J.K. Hite, US Naval Research Laboratory, K.F. Ludwig, Boston University, C.J. Palmstrøm, University California Santa Barbara, C.R. Eddy, Jr., U.S. Naval Research Laboratory |
| 5:20pm | EM+SS-TuA10 Aqueous Ammonium Sulfide Treatments on SiGe Surfaces Stacy Heslop, L. Peckler, A.J. Muscat, University of Arizona |
| 6:00pm | EM+SS-TuA12 The Structural Stability and Phase Transition of MoTe2 Activated by Thermal Annealing Hui Zhu, Q. Wang, C. Zhang, R. Addou, K.J. Cho, M. Kim, R.M. Wallace, University of Texas at Dallas |