| AVS 64th International Symposium & Exhibition | |
| Thin Films Division | Thursday Sessions |
| Session TF-ThP |
| Session: | Thin Films Poster Session |
| Presenter: | Chao-Te Lee, Instrument Technology Research Center, National Applied Research Laboratories, Taiwan, Republic of China |
| Authors: | C.T. Lee, Instrument Technology Research Center, National Applied Research Laboratories, Taiwan, Republic of China P.K. Chiu, Instrument Technology Research Center, National Applied Research Laboratories D. Chiang, Instrument Technology Research Center, National Applied Research Laboratories W.-C. Chen, Instrument Technology Research Center, National Applied Research Laboratories, Taiwan, Republic of China J.-H. Xie, Department of Optoelectronic System Engineering, Minghsin University of Science and Technology C.-C. Jaing, Department of Optoelectronic System Engineering, Minghsin University of Science and Technology |
| Correspondent: | Click to Email |
In this work, the novel electrochromic WO3/Ag multilayer film on ITO glass were designed and made by RF magnetron sputtering at room temperature. The effects of Ag film on the microstructure and optical properties of the WO3/Ag multilayers were examined by field emission scanning electron microscopy, X-ray diffraction (XRD) and spectrometer. The average transmittance in the range from 400 to 700 nm of WO3/Ag multilayer films was slight increased from 81.13 (WO3/ITO glass) to 84.74%. The electrochromic characteristics of WO3/Ag multilayer films were investigated by the bleaching and colored WO3/Ag multilayer film. The variation of average transmittance in the visible range of bleaching and colored WO3/Ag multilayer film is above 65%. Particularly, the average transmittance in the range from 800 to 1000 nm of WO3/Ag multilayer film was greatly decreased from 74.21(WO3/ITO glass) to 1.59%. We found that novel WO3/Ag multilayer film is suitable or electrochromic and hot mirror application.