AVS 64th International Symposium & Exhibition
    Thin Films Division Thursday Sessions
       Session TF-ThP

Paper TF-ThP22
Predicting Feature Size of AZ 9260 Positive Photoresist Processed by Two-photon Lithography

Thursday, November 2, 2017, 6:30 pm, Room Central Hall

Session: Thin Films Poster Session
Presenter: Shelby Maddox, University of Arkansas
Authors: S. Maddox, University of Arkansas
M. Zou, University of Arkansas
Correspondent: Click to Email
Two-photon photolithography (TPP) is a promising fabrication method which allows very fine control over complex shapes in maskless lithography and is promising for creating 3D nanostructures. In this process, a high-fluence laser is focused into a photoresist in a discrete volume called a voxel. In the case of a negative photoresist, this volume is polymerized. In the case of a positive photoresist, the volume is monomerized. This size of this voxel depends on process parameters such as the focusing objective, the laser power, and the laser scanning speed across the photoresist surface. It is desirable to be able to precisely predict the feature width based on these process parameters. In this work, we present a mathematical model for predicting feature width created by a single-voxel using AZ 9260 positive photoresist with TPP. AZ 9260 is a high aspect ratio positive photoresist used in maskless lithography. The mathematical models are created which describe the resultant feature width as a function of the focusing objective, laser power, and the laser scanning speed. The features can be used as masks in a subsequent metal deposition to create conductive nanostructures for micro-electrode design, for use in biological research and multifunctional surfaces.