AVS 64th International Symposium & Exhibition
    Thin Films Division Thursday Sessions
       Session TF-ThP

Paper TF-ThP13
The Effect of e-gun Deposition Process Variables on the Film Characteristics of the Chromium Oxide

Thursday, November 2, 2017, 6:30 pm, Room Central Hall

Session: Thin Films Poster Session
Presenter: Po-Kai Chiu, National Applied Research Laboratories, Taiwan, Republic of China
Authors: P.K. Chiu, National Applied Research Laboratories, Taiwan, Republic of China
Y.T. Liao, National Tsing Hua University, Taiwan, Republic of China
H.Y. Tasi, National Tsing Hua University, Taiwan, Republic of China
D. Chiang, National Applied Research Laboratories, Taiwan, Republic of China
Correspondent: Click to Email
The film characteristics and optical properties of the CrOx films prepared by the e-gun deposition with the different process variables are investigated. The process variables include the various oxygen flow rates, applied substrate temperatures to 200oC, and with or without Ar and O2 ion-assisted deposition. The optical constants of the deposited films with different process variables are determined from the reflectance and transmittance measurements obtained using spectrophotometer ranged from 350 nm to 2000 nm. The microstructures of the films are examined by the XRD, SEM, and XPS. The electrical conductivity is measured by four-point probe instrument. All the prepared films are amorphous without the significant pillar structure. The optical and electrical properties are illustrated by the analyzed XPS results with the ratio of the contribution of the free electrons to ion bonds in the deposited CrOx films. The major process variable to possess high extinction coefficient and low reflectance is the oxygen flow rate during the CrOx film deposition without ion-assisted deposition in the study.