AVS 64th International Symposium & Exhibition
    Thin Films Division Thursday Sessions
       Session TF+MI-ThA

Invited Paper TF+MI-ThA10
Sputter Beam Epitaxy: Innovation towards Spin Control in Intermetallic Thin Films

Thursday, November 2, 2017, 5:20 pm, Room 20

Session: Control, Characterization, and Modeling of Thin Films II
Presenter: Adam Hauser, The University of Alabama
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The vast array of interesting crystal structures and the wealth of elemental choices guarantee that we are never lacking for new opportunities in designing and making “custom-built” materials, if a method can be devised to build these complex materials systems. This talk will highlight our progress in thin film growth via Sputter Beam Epitaxy, an approach combining the fabrication strengths of off-axis magnetron sputtering and molecular beam epitaxy. We will focus on highly-ordered B2 alloys (including the Heusler sub-class) with an eye towards determination of the true properties of ideally ordered materials and tuning towards ideal spin damping properties.